Since the industrial use of the electron beam as a reliable high power precision tool for challenging welding tasks, its properties have been applied to a wide application spectrum in manufacturing and scientific environment. ...
Since the industrial use of the electron beam as a reliable high power precision tool for challenging welding tasks, its properties have been applied to a wide application spectrum in manufacturing and scientific environment. ...
Experimental investigation of electron beam induced graft copolymerization of starch (corn and potato), using electron beam generated by a linear accelerator with energy of 5.5 MeV and 6.23 MeV is performed. The modification ...
The electron-beam technologies are extensively used for radiation cross-linking of polymer compositions. The most perfect instruments for radiation treatment of polymers are powerful industrial electron accelerators. When ...
Budker Institute of Nuclear Physics is developing and producing the powerful pulse radio frequency industrial electron accelerators type ILU. These machines cover the energy range from 0.8 to 10 MeV, the maximum beam power ...
Copolymers starch-graft-polyacrylamide (St-g-PAM) were synthesized by electron beam irradiation as a free radical initiator to develop new functional materials with application in surface water treatment. St-g-PAM loaded with ...
The paper deals with the investigation of the effects of the electron beam irradiation on the rheological behaviour of pectins. The results showed that the rheological parameters of the pectin aqueous suspensions were influenced ...
The wax, originated as a by-product of Fisher-Tropsh synthesis, can be converted to liquid engine fuel via a circulating mode of radiation-thermal cracking. The method is based on indirect action of radiation upon the wax ...
Hydrogen Silsesquioxane (HSQ) is used as a high-resolution resist with resolution down below 10 nm half-pitch. High-contrast and high-resolution patterning in the negative electron beam HSQ resist has numerous potential applications. ...
In this paper the negative HSQ (hydrogen silsesquioxane) XR 1541 electron beam resist is investigated in terms of its performance in the e-beam lithography for chosen substrate materials, namely for silicon, Ag on Si substrates, ...
The object of the pulsed Electron beam designed in this work is to modify the surface layer of metals by melting through uniform adiabatic heating in the order of a few microseconds. With a maximum diameter of the beam 70 ...