Thin films of tungsten oxide are obtained at different technological parameters using electron beam evaporation process. Their optical and structure properties are investigated and the relation with process parameters is discussed. ...
Thin films of tungsten oxide are obtained at different technological parameters using electron beam evaporation process. Their optical and structure properties are investigated and the relation with process parameters is discussed. ...
Recent developments at TWI in electron beam technology demonstrate how an electron beam used at lower power may be employed for a variety of purposes including a novel process, Surfi-Sculpt®. Surfi-Sculpt can neither be described ...
In liquid metal technology, steel corrosion is a well-known problem. Dissolution of alloying elements into the liquid metal is prevented by the formation of a protective oxide layer on the steel surface. However, in high temperature ...
Electron beam age hardening at repair of combustion chamber made of heat-resistant chrome nickel alloys is studied. At replacing old flange with a new one (welded by electron beam) furnace heat treatment in terms of age hardening ...
The basic factors that affect the physical and mechanical properties of microporous material, pore volume and pore size therein. The main factors that affect the physical and mechanical properties of the microporous material, pore volume and pore size were evaluated.
...
The problems of microlayer metal materials, obtained by condensation from vapor phase are discussed. Example of copper-molybdenum materials obtaining was first shown possibility to produce composites having a layer thickness ...
Modern scientific level of dispersion-strengthened metals condensed from the vapor phase engineering is presented. The physical and mechanical properties of these materials depend on selected matrix type (pure metal, metal ...
Gas discharge-based electron sources represent high-power and low-cost tools for a variety of processes regularly required in vacuum high-rate coating. Here, the fields of substrate pre-treatment, electron beam generation ...
Hydrogen Silsesquioxane (HSQ) is used as a high-resolution resist with resolution down below 10 nm half-pitch. High-contrast and high-resolution patterning in the negative electron beam HSQ resist has numerous potential applications. ...
In this paper the negative HSQ (hydrogen silsesquioxane) XR 1541 electron beam resist is investigated in terms of its performance in the e-beam lithography for chosen substrate materials, namely for silicon, Ag on Si substrates, ...
2012-2023