Preliminary simulation of Magnetron sputtering using Pegasus software
In an r.f.-d.c. coupled magnetron sputtering system, the magnetron discharge was generated by a 13.56 MHz r.f. source, and a d.c. power was simultaneously applied to a tin target through a low-pass filter in order to control the incident ion energy on the target. When an extremely low r.f. power 5W and d.c. power sources were applied simultaneously to the target, the glow discharge was about one-seventh of that in the case of the d.c. magnetron discharge.