Tomonori Tabe

20180910-06
Construction of a preliminary file backup system for surface analysis data using secret sharing technique
Nobuharu Okamitsu, Tomonori Tabe, Ryota Matsuda, Noriyuki Yamada, Toyoharu Takemoto, Takeshi Tanaka

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We have established a preliminary file backup system to study the outline of secret sharing technology and test operations. Secret sharing scheme is a key management scheme or key establishment scheme invented separately in ...  read more

20180708-10
Applied voltage dependence of plasma characteristic for food sterilization using PBII method
Kenichi Watanabe, Ryota Matsuda, Tomonori Tabe, Motoko Hiyama, Kento Sakasegawa, Yuuta Yamamoto, Koji Kakugawa, Takeshi Tanaka

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We used the PBII (Plasma Based Ion Implantation) method with self-igniting plasma and negative high-voltage pulsed power supply only to calculate the ion density inside a formed ion sheath based on a modulation circuit, by ...  read more

20180708-08
Experimental study on sterilization of food with self-igniting plasma formed from liquid using plasma-based ion implantation
Koji Kakugawa, Manami Hosotani, Miyo Arikado, Tomonori Tabe, Kenta Fukutomi, Yoshinobu Tsuchiya, Takeshi Tanaka

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We attempted to sterilize food using plasma-based ion implantation with self-ignited plasma formed from liquid. Based on sterilization experiments, hydrogen peroxide was selected to generate self-ignited plasma. The most effective ...  read more

20180708-06
Contact characteristic for Iridium-coated probe
Koichi Miyazono, Toshitaka Yorita, Kenta Fukutomi, Tomonori Tabe, Hitoshi Suizu, Ryota Matsuda, Masayuki Yamauchi, Takeshi Tanaka

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This study considers the issue of higher probe contact resistance associated with oxidation of Al attached to the probe surface. In an experiment involving Al electrodes, there was virtually no increase in contact resistance ...  read more

20180708-05
Preliminary simulation of Magnetron sputtering using Pegasus software
Hitoshi Suizu, Ryota Matsuda, Tomonori Tabe, Hiroshi Toyota, Takeshi Tanaka

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In an r.f.-d.c. coupled magnetron sputtering system, the magnetron discharge was generated by a 13.56 MHz r.f. source, and a d.c. power was simultaneously applied to a tin target through a low-pass filter in order to control ...  read more