Applied voltage dependence of plasma characteristic for food sterilization using PBII method
Kenichi Watanabe, Ryota Matsuda, Tomonori Tabe, Motoko Hiyama, Kento Sakasegawa, Yuuta Yamamoto, Koji Kakugawa, Takeshi Tanaka
We used the PBII (Plasma Based Ion Implantation) method with self-igniting plasma and negative high-voltage pulsed power supply only to calculate the ion density inside a formed ion sheath based on a modulation circuit, by measuring discharge current and high voltage waveform for self-igniting plasma used for sterilization to determine the plasma density and sheath length. We also calculated plasma density used in combination with an RF power supply.
Cite this article as:
Watanabe K., Matsuda R., Tabe T., Hiyama M., Sakasegawa K., Yamamoto Y., Kakugawa K., Tanaka T. Applied voltage dependence of plasma characteristic for food sterilization using PBII method. Journal – Electrotechnica & Electronica (E+E), Vol. 53, No. 7-8, 2018, pp. 204-207, ISSN: 0861-4717 (Print), 2603-5421 (Online)