Plasma density is estimated from the target voltage and current characteristics of the pulse modulator circuit in plasma-based ion implantation. The voltage recovery time constant directly reflects the ion sheath characteristics, ...
Plasma density is estimated from the target voltage and current characteristics of the pulse modulator circuit in plasma-based ion implantation. The voltage recovery time constant directly reflects the ion sheath characteristics, ...
Plasma-based ion implantation is a recently developed technique used to modify the surface of materials by immersion in plasma coupled with the application of a negative bias voltage.
In this study, we compare the properties ...
Plasma base ion implantation (PBII) with self-ignited plasma generated by only pulsed voltages to the test specimen has been applied to the sterilization process. We found that the PBII process reduced the numbers of active ...
Plasma based ion implantation (PBII) with high negative pulsed voltage applied to the test specimen has been applied to the sterilization process as a technique suitable for three-dimensional work pieces. We found that the ...
2012-2023