Plasma-based ion implantation (PBII) method is a technique that allows uniform ion implantation to a sample by applying a negative voltage to the model to draw and accelerate ions in the ion sheath existing around the piece. ...
Plasma-based ion implantation (PBII) method is a technique that allows uniform ion implantation to a sample by applying a negative voltage to the model to draw and accelerate ions in the ion sheath existing around the piece. ...