Takeshi Tanaka

20180708-09
Optimum conditions for sterilization of Geobacillus stearothermophilus spores using plasma-based ion implantation
Motoko Hiyama, Koji Kakugawa, Aya Yakushiji, Kenichi Watanabe, Ryota Matsuda, Yoshinobu Tsuchiya, Takeshi Tanaka

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In recent years, substantial research into low-temperature sterilization techniques has been conducted. Plasma-based ion implantation (PBII) is a low-temperature, cost-effective technique for sterilizing medical equipment, ...  read more

20180708-08
Experimental study on sterilization of food with self-igniting plasma formed from liquid using plasma-based ion implantation
Koji Kakugawa, Manami Hosotani, Miyo Arikado, Tomonori Tabe, Kenta Fukutomi, Yoshinobu Tsuchiya, Takeshi Tanaka

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We attempted to sterilize food using plasma-based ion implantation with self-ignited plasma formed from liquid. Based on sterilization experiments, hydrogen peroxide was selected to generate self-ignited plasma. The most effective ...  read more

20180708-07
Control of plasma parameters by Penning ion effect
density distribution of plasma, density of oxygen ions, food sterilization, Pegasus simulations, Penning effect

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We attempted to control the density of oxygen ions by adding argon gas and helium gas with metastable voltage to oxygen gas with ionization voltage, in order to determine the optimum combination and ratio of gases for food ...  read more

20180708-06
Contact characteristic for Iridium-coated probe
Koichi Miyazono, Toshitaka Yorita, Kenta Fukutomi, Tomonori Tabe, Hitoshi Suizu, Ryota Matsuda, Masayuki Yamauchi, Takeshi Tanaka

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This study considers the issue of higher probe contact resistance associated with oxidation of Al attached to the probe surface. In an experiment involving Al electrodes, there was virtually no increase in contact resistance ...  read more

20180708-05
Preliminary simulation of Magnetron sputtering using Pegasus software
Hitoshi Suizu, Ryota Matsuda, Tomonori Tabe, Hiroshi Toyota, Takeshi Tanaka

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In an r.f.-d.c. coupled magnetron sputtering system, the magnetron discharge was generated by a 13.56 MHz r.f. source, and a d.c. power was simultaneously applied to a tin target through a low-pass filter in order to control ...  read more

20150506-06
A study on glare in a sports lighting environment using LED lighting and diffusion plates
Takeshi Tanaka, Koji Mukai, Masayuki Yamauchi, Masao Kochi, Atsushi Ikeda, Hideo Kuzuhara, Koichi Matsushita, Go Hironobu

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Illumination sources have been rapidly shifting in recent years to light-emitting diodes (LED), which are capable of producing more than 10,000 cd/m2 at maximum luminance. This light intensity is far greater than ...  read more

20160506-57
Simulation of ion implantation for Si using TCAD
Takuma Adachi, Yuki Hirota, Yosuke Nakaguchi, Kota Takahama, Koji Mukai, Masayuki Yamauchi, Nobuharu Okamitsu, Takeshi Tanaka

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To realize further high performance in semiconductor devices, the development of efficient processes and a reduction in the number of trial productions are indispensable. Therefore, the orientation of development plans and ...  read more

20160506-56
Spore-forming bacteria sterilization using plasma-based ion implantation (2nd report)
Koji Kakugawa, Kai Saitoh, Kenya Hayashi, Kazuhiro Shimono, Hiromitsu Noguchi, Yoshinobu Tsuchiya, Takeshi Tanaka

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A main purpose of sterilization is to kill the harmful microorganisms. The spore-forming bacteria which are present in foods frequently cause food spoilage. Although the vegetative cells of those bacteria are sterilized easily, ...  read more

20160506-53
Training students using presentations at meetings in the fields of physics, engineering and technologies
Tomomi Tanioka, Katia Vutova, Masayuki Yamauchi, Takeshi Tanaka

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Rapid globalization requires for researchers and engineers to have broad scientific knowledge, logical thinking, problem-solving ability, and expressiveness. To improve these skills and to help students advance in their practical ...  read more