In this paper the contrast and sensitivity characteristics are investigated concerning the negative tone electron beam resist HSQ (hydrogen silsesquioxane) and the positive tone SML300 electron beam organic resist, designed ...
In this paper the contrast and sensitivity characteristics are investigated concerning the negative tone electron beam resist HSQ (hydrogen silsesquioxane) and the positive tone SML300 electron beam organic resist, designed ...
In this paper the negative HSQ (hydrogen silsesquioxane) XR 1541 electron beam resist is investigated in terms of its performance in the e-beam lithography for chosen substrate materials, namely for silicon, Ag on Si substrates, ...
2012-2023