Mean and variance models

20230200-04
Robust model-based approach for electron beam lithography process control
Asya Asenova-Robinzonova, Elena G. Koleva

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The present study is directed toward the investigates the dependency of the geometric characteristics of the developed post-exposure negative electron resist AR-N 7520 profiles on the parameters of the electron beam lithography ...  read more

20190910-02
Overall robust optimization approach for electron beam induced grafting process
Lilyana Koleva, Elena Koleva, Monica R. Nemtanu, Mirela Braşoveanu

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This paper presents the implementation of the overall desirability function – the overall robust optimization approach – for multi-criteria parameter optimization in the robust engineering case, based on estimated models ...  read more