Mean and variance models

Robust model-based approach for electron beam lithography process control
Asya Asenova-Robinzonova, Elena G. Koleva

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The present study is directed toward the investigates the dependency of the geometric characteristics of the developed post-exposure negative electron resist AR-N 7520 profiles on the parameters of the electron beam lithography ...  read more

Overall robust optimization approach for electron beam induced grafting process
Lilyana Koleva, Elena Koleva, Monica R. Nemtanu, Mirela Braşoveanu

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This paper presents the implementation of the overall desirability function – the overall robust optimization approach – for multi-criteria parameter optimization in the robust engineering case, based on estimated models ...  read more