In the paper is presented a technological cluster for mask less e-beam lithography (ML2) and metrology for fast non destructive defect inspection and review, and for CD, 2D and 3D measurement.
The cluster potentialities comply ...
In the paper is presented a technological cluster for mask less e-beam lithography (ML2) and metrology for fast non destructive defect inspection and review, and for CD, 2D and 3D measurement.
The cluster potentialities comply ...
In the paper is presented multicolumn e-beam lithography (MCL) system intended generally for production of templates.
The system was designed in two versions: with Schottky emitter and LaB6/CeB6 emitter.
System with Schottky ...
2012-2023