automatic control

Robust model-based approach for electron beam lithography process control
Asya Asenova-Robinzonova, Elena G. Koleva

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The present study is directed toward the investigates the dependency of the geometric characteristics of the developed post-exposure negative electron resist AR-N 7520 profiles on the parameters of the electron beam lithography ...  read more

Invariant numerical PI control of analog processes
Milan M. Stankov

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The article presents Proportional Integral (PI)regulation of a production object with an analog measure of the final (output) output using a regulator whose control function is programmed, calculated and affects the object ...  read more