A multi column lithography system for low and medium volume mask manufacturing
Viacheslav V. Kazmiruk, Ilya G. Kurganov, Alexander A. Podkopaev, Tatiana N. Savitskaja

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In the paper is presented multicolumn e-beam lithography (MCL) system intended generally for production of templates.

The system was designed in two versions: with Schottky emitter and LaB6/CeB6 emitter.

System with Schottky ...  read more