In this paper the contrast and sensitivity characteristics are investigated concerning the negative tone electron beam resist HSQ (hydrogen silsesquioxane) and the positive tone SML300 electron beam organic resist, designed ...
In this paper the contrast and sensitivity characteristics are investigated concerning the negative tone electron beam resist HSQ (hydrogen silsesquioxane) and the positive tone SML300 electron beam organic resist, designed ...
Hydrogen Silsesquioxane (HSQ) is used as a high-resolution resist with resolution down below 10 nm half-pitch. High-contrast and high-resolution patterning in the negative electron beam HSQ resist has numerous potential applications. ...